Blaze DFM to Exhibit at DATE 2008

What: Blaze DFM Exhibiting Design Automation and Test in Europe (DATE) 2008
When: March 10-14, 2008
Where: ICM, Munich, Germany

Blaze will be offering product demonstrations in the ICM exhibition hall.

Blaze MO leakage power optimization software has been proven in silicon to reduce subthreshold leakage power and variability by up to 20 percent and 30 percent, respectively, on 90nm and 65nm designs, resulting in substantial double-digit gains in parametric yield.

Blaze MO may be used to optimize both existing designs as well as brand new designs. It can even be used on designs that have already been taped out.

Blaze MO’s patented transistor gate-length critical dimension (CD) biasing does not require any changes to a design’s architecture, cell libraries, intellectual property blocks, logic design, or layout.

Blaze MO does not require replacing any existing design tools. It does not require major changes to the design flow, timing signoff, or handoff to manufacturing.

         Blaze Electrical DFM Product Demonstrations
         March 10-14, 2008
         ICM, Booth #C41

For more information, visit the Blaze DFM website at www.blaze-dfm.com/reduce.html

About Blaze DFM
Blaze DFM provides software solutions to fabless semiconductor companies, integrated device manufacturers, and silicon foundries. Blaze products give IC designers greater control over manufacturing variability, improving yield and shortening time to volume production. Blaze DFM, Inc., 1275 Orleans Drive, Sunnyvale, CA 94089, 408.470.4900. Web: http://www.blaze-dfm.com
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