Key Directions and a Roadmap for Electrical Design for Manufacturability
A. B. Kahng, Proc. European Solid-State Circuits Conf., 2007

Detailed Placement for Leakage Reduction using Systematic Through-Pitch Variation
A. B. Kahng, S. Muddu and P. Sharma, Proc. International Symposium on Low Power Electronics and Design, 2007

On-Line Adjustable Buffering for Runtime Power Reduction
A. B. Kahng, S. Reda and P. Sharma, Proc. International Symposium on Quality Electronic Design, March 2007

A DOE Set for Normalization-Based Extraction of Fill Impact on Capacitances
A. B. Kahng and R. O. Topaloglu, Proc. International Symposium on Quality Electronic Design, March 2007, March 2007 (Best Paper award)

A Global Minimum Clock Distribution Network Augmentation Algorithm for Guaranteed Clock Skew Yield
J. Hu, A. B. Kahng, B. Liu, G. Venkataraman and X. Xu, Proc. Asia and South Pacific Design Automation Conf., January 2007

Fill for Shallow Trench Isolation CMP
A. B. Kahng and R. O. Topaloglu, Proc. ACM/IEEE Intl. Conf. on Computer-Aided Design, November 2006

Interconnect Matching Design Rule Inferring and Optimization through Correlation Extraction
A. B. Kahng and R. O. Topaloglu, Proc. International Conference of Computer Design, October 2006

A Procedure and Program to Calculate Shuttle Mask Advantage
A. Balasinski, A. B. Kahng, W. Sachs-Baker and X. Xu, Proc. 27th BACUS Symposium on Photomask Technology and Management, 2006

A General Framework for Multi-Flow, Multi-Layer, Multi-Project Reticles Design
A. B. Kahng and X. Xu, Proc. 27th BACUS Symposium on Photomask Technology and Management, 2006

Fast Dual-Graph Based Hot-Spot Detection
A. B. Kahng, C.-H. Park and X. Xu, Proc. 27th BACUS Symposium on Photomask Technology and Management, 2006

Auxiliary Pattern for Cell-Based OPC
A. B. Kahng and C.-H. Park, Proc. 27th BACUS Symposium on Photomask Technology and Management, 2006

Timing-Driven Steiner Trees are (Practically) Free
C. J. Alpert, A. B. Kahng, C. N. Sze and Q. Wang, Proc. ACM/IEEE Design Automation Conference, July 2006

Statistical Gate Delay Calculation with Crosstalk Alignment Consideration
A. B. Kahng, B. Liu and X. Xu, Proc. ACM/IEEE GLSVLSI, April 2006

Fast Yield-Driven Fracture for Variable Shaped-Beam Mask Writing
A. B. Kahng, X. Xu and A. Zelikovsky, Photomask and Next-Generation Lithography Mask Technology XI, April 2006

Impact of Gate-Length Biasing on Threshold-Voltage Selection
A. B. Kahng, S. Muddu and P. Sharma, International Symposium on Quality Electronic Design, April 2006

Study of Floating Fill Impact on Interconnect Capacitance
A. B. Kahng, K. Samadi and P. Sharma, International Symposium on Quality Electronic Design, April 2006

Lens Aberration-Aware Timing-Driven Placement
A. B. Kahng, C.-H. Park, P. Sharma and Q. Wang, Proc. Design Automation and Testing in Europe, March 2006

Lithography Simulation-Based Full-chip Design Analyses
P. Gupta, A. B. Kahng and P. Sharma, Proc. SPIE Conference on Design and Process Integration for Microelectronic Manufacturing, March 2006

Modeling of Non-Uniform Device Geometries for Post-Lithography Circuit Analysis
P. Gupta, A. B. Kahng, Y. Kim, S. Shah and D. Sylvester, Proc. SPIE Conference on Design and Process Integration for Microelectronic Manufacturing, March 2006

Modeling edge placement error distribution in standard cell library
P. Gupta, A. B. Kahng, S. Muddu and S. Nakagawa, Proc. SPIE Conference on Design and Process Integration for Microelectronic Manufacturing, March 2006

Closing the Loop in Interconnect Analyses and Optimization: CMP Fill, Lithography and Timing
P. Gupta, A. B. Kahng, O.S. Nakagawa and K. Samadi, Proc. 22nd Intl. VLSI/ULSI Multilevel Interconnection (VMIC) Conf., October 2005

Yield-Driven Multi-Project Reticle Design and Wafer Dicing
A. B. Kahng, I. I. Mandoiu, X. Xu, and A. Zelikovsky, Proc. 25th BACUS Symposium on Photomask Technology and Management, October 2005

Modeling OPC Complexity for Design for Manufacturability
P. Gupta, A. B. Kahng, S. Muddu, S. Nakagawa and C.-H. Park, Proc. 25th BACUS Symposium on Photomask Technology and Management, October 2005

Enhanced Resist and Etch CD Control by Design Perturbation
P. Gupta, A. B. Kahng and C.-H. Park, Proc. 25th BACUS Symposium on Photomask Technology and Management, October 2005

Defocus-Aware Leakage Estimation and Control
A. B. Kahng, S. Muddu and P. Sharma, Proceedings of the 2005 International Symposium on Low Power Electronics and Design, August 2005

Self-Compensating Design for Focus Variation
P. Gupta, A. B. Kahng, Y. Kim, and D. Sylvester, Proc. Design Automation Conference, June 2005

Improving OPC Quality Via Interactions Within the Design-to-Manufacturing Flow
P. Gupta, A. B. Kahng and C.-H. Park, Photomask and Next-Generation Lithography Mask Technology X, April 2005

Simultaneous Buffer Insertion and Wire Sizing Considering Systematic CMP Variation and Random Leff Variation
L. He, A. B. Kahng, K. Tam and J. Xiong, Proc. International Symposium on Physical Design, April 2005

Design of IC Interconnects with Accurate Modeling of CMP
L. He, A. B. Kahng, K. Tam and J. Xiong, International Society for Optical Engineering (SPIE) Symposium on Microlithography, March 2005

Performance-Driven OPC for Mask Cost Reduction
P. Gupta, A.B. Kahng, D. Sylvester and J. Yang, Proc. IEEE International Symposium on Quality Electronic Design, March 2005

A Practical Transistor-Level Threshold Voltage Assignment Methodology
P. Gupta, A. B. Kahng and P. Sharma, Proc. IEEE International Symposium on Quality Electronic Design, March 2005

Manufacturing-Aware Design Methodology for Assist Feature Correctness
P. Gupta, A. B. Kahng and C.-H. Park, Proc. SPIE Conf. on Design and Process Integration for Microelectronic Manufacturing, Feb. 2005

Detailed Placement for Improved Depth of Focus and CD Control
P. Gupta, A. B. Kahng and C.-H. Park, Proc. Asia and South Pacific Design Automation Conf., Jan. 2005

Evaluation of the New OASIS Format for Layout Fill Compression
Y. Chen, A. B. Kahng, G. Robins, A. Zelikovsky, and Y. Zheng, Proc. 11th IEEE Intl. Conf. on Electronics, Circuits and Systems, December 2004

Reticle Floorplanning With Guaranteed Yield for Multi-Project Wafers
A. B. Kahng, and S. Reda, Proc. ACM/IEEE Intl. Conf. on Computer Design, October 2004

Variability-Driven Considerations in the Design of Integrated-Circuit Global Interconnects
L. He, A. B. Kahng, K. H. Tam and J. Xiong, Proc. 21th Intl. VLSI Multilevel Interconnection (VMIC) Conf., September 2004

Joining the Design and Mask Flows for Better and Cheaper Masks
P. Gupta, A. B. Kahng, C.-H. Park, P. Sharma, D. Sylvester and J. Yang, Proc. 24th BACUS Symposium on Photomask Technology and Management, September 2004

Yield- and Cost-Driven Fracturing for Variable Shaped-Beam Mask Writing
A. B. Kahng, X. Xu and A. Zelikovsky, Proc. 24th BACUS Symposium on Photomask Technology and Management, September 2004

Toward a Methodology for Manufacturability Driven Design Rule Exploration
L. Capodieci, P. Gupta, A. B. Kahng, D. Sylvester and J. Yang, Proc.ACM/IEEE Design Automation Conf., June 2004

Selective Gate-Length Biasing for Cost-Effective Runtime Leakage Control
P. Gupta, A. B. Kahng, P. Sharma and D. Sylvester, Proc.ACM/IEEE Design Automation Conf., June 2004

Manufacturing-Aware Physical Design
P. Gupta and A. B. Kahng, Proc. IEEE/ACM Intl. Conference on Computer-Aided Design, November 2003

A Cost-Driven Lithographic Correction Methodology Based on Off-the-Shelf Sizing Tools
P. Gupta, A. B. Kahng, D. Sylvester and J. Yang, Proc. ACM/IEEE Design Automation Conf., June 2003

Performance-Impact Limited Area Fill Synthesis
Y. Chen, P. Gupta and A. B. Kahng, Proc. ACM/IEEE Design Automation Conf., June 2003

Resist Heating Dependence on Subfield Scheduling in 50kV Electron Beam Maskmaking
S. V. Babin, A. B. Kahng, I. I. Mandoiu, and S. Muddu, Photomask and Next-Generation Lithography Mask Technology X, Proc. SPIE #5130, April 2003

Data Volume Reduction in Dummy Fill Generation
Y. Chen, A. B. Kahng, G. Robins, A. Zelikovsky, and Y. H. Zheng, Proc. Design Automation and Testing in Europe, March 2003

Subfield Scheduling for Throughput Maximization in Electron-Beam Photomask Fabrication
S. V. Babin, A. B. Kahng, I. I. Mandoiu, and S. Muddu, Emerging Lithographic Technologies VII, R. L. Engelstad (ed.), Proc. SPIE #5037, Feb. 2003

Toward Performance-Driven Reduction of the Cost of RET-Based Lithography Control
D. Sylvester, P. Gupta, A. B. Kahng, and J. Yang, Proc. SPIE Conf. on Design and Process Integration for Microelectronic Manufacturing, Feb. 2003

Performance-Impact Limited Dummy Fill Insertion
Y. Chen, P. Gupta, and A. B. Kahng, Proc. SPIE Conf. on Design and Process Integration for Microelectronic Manufacturing, Feb. 2003

Compression Algorithms for "Dummy Fill" VLSI Layout Data
A. B. Kahng, R. Ellis, and Y. Zheng, Proc. SPIE Conf. on Design and Process Integration for Microelectronic Manufacturing, Feb. 2003

Non-Tree Routing for Reliability and Yield Improvement
A. B. Kahng, B. Liu, and I. I. Mandoiu, Proc. IEEE/ACM Intl. Conference on Computer-Aided Design, November 2002

Design Sensitivities to Variability: Extrapolation and Assessments in Nanometer VLSI
Y. Cao, P. Gupta, A. B. Kahng, D. Sylvester and J. Yang, IEEE ASIC/SoC Conference, September 2002

A Roadmap and Vision for Physical Design
A. B. Kahng, Proc. ACM/IEEE Intl. Symp. on Physical Design, April 2002

Closing the Smoothness and Uniformity Gap in Area Fill Synthesis
Y. Chen, A. B. Kahng, G. Robins and A. Zelikovsky, Proc. ACM/IEEE Intl. Symp. on Physical Design, April 2002

Design-Process Integration and Shared Red Bricks
A. B. Kahng, SPIE Conference on Design and Process Integration for Microelectronic Manufacturing, Santa Clara, March 2002

Monte-Carlo Methods for Chemical-Mechanical Planarization on Multiple-Layer and Dual-Material Models
Y. Chen, A. B. Kahng, G. Robins and A. Zelikovsky, SPIE Conference on Design and Process Integration for Microelectronic Manufacturing, March 2002

Hierarchical Dummy Fill for Process Uniformity
Y. Chen, A. B. Kahng, G. Robins and A. Zelikovsky, Proc. Asia and South Pacific Design Automation Conf., Jan. 2001

Practical Iterated Fill Synthesis for CMP Uniformity
Y. Chen, A. B. Kahng, G. Robins and A. Zelikovsky, Proc. ACM/IEEE Design Automation Conf., June 2000

Monte-Carlo Algorithms for Layout Density Control
Y. Chen, A. B. Kahng, G. Robins and A. Zelikovsky, Proc. Asia and South Pacific Design Automation Conf., Jan. 2000

The T-Join Problem in Sparse Graphs: Applications to Phase Assignment Problem in VLSI Mask Layout
P.Berman, A. B. Kahng, D. Vidhani and A. Zelikovsky, Workshop on Algorithms and Data Structures (WADS), LNCS(vol. 1663), August 1999

Subwavelength Lithography and its Potential Impact on Design and EDA
A. B. Kahng and Y. C. Pati, Proc. ACM/IEEE Design Automation Conf., June 1999

Subwavelength Optical Lithography: Challenges and Impact on Physical Design
A. B. Kahng and Y. C. Pati, Proc. ACM Intl. Symp. on Physical Design, April 1999

Optimal Phase Conflict Removal for Layout of Dark Field Alternating Phase Shifting Masks
P. Berman, A. B. Kahng, D. Vidhani, H. Wang and A. Zelikovsky, Proc. ACM Intl. Symp. on Physical Design, April 1999

New Multilevel and Hierarchical Algorithms for Layout Density Control
A. B. Kahng, G. Robins, A. Singh and A. Zelikovsky,  Proc. Asia and South Pacific Design Automation Conf., Jan. 1999

New and Exact Filling Algorithms for Layout Density Control
A. B. Kahng, G. Robins, A. Singh and A. Zelikovsky, Proc. IEEE Intl. Conf. on VLSI Design, Jan. 1999

IC Layout and Manufacturability: Critical Links and Design Flow Implications
A. B. Kahng, Proc. IEEE Intl. Conf. on VLSI Design, Jan. 1999

Filling and Slotting: Analysis and Algorithms
A. B. Kahng, G. Robins, A. Singh, H. Wang and A. Zelikovsky, Proc. ACM/IEEE Intl. Symp. on Physical Design, April 1998

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